Arc-Discharge Type High Vacuum Ion Plating.

Damping Properties of Arc Ion Plating NiCrAlY Coating with Vacuum Annealing

NiCrAlY coating was prepared on a stainless steel substrate by an arc ion plating machine and the annealing experiments were carried out at different temperatures using a tube furnace. The effects of annealing temperatures on the morphology, structure, chemical composition and phase structure of the coating were characterized by SEM, EDS and XRD, respectively. The change of microstructure is di...

Macroparticle Charging in a Pulsed Vacuum Arc Thruster Discharge

A pulsed vacuum arc discharge emits a plasma as well as macroparticles in the form of micron-sized molten droplets of cathode material. Due to their trajectory and size, these macroparticles often pose a contamination threat for both spacecraft-based thrusters, and thin film deposition systems. The charge of these macroparticles was experimentally measured, and compared to a model based on ther...

Ion energy distribution functions of vacuum arc plasmas

Temporal development of ion beam mean charge state in pulsed vacuum arc ion sources.

Vacuum arc ion sources, commonly also known as "Mevva" ion sources, are used to generate intense pulsed metal ion beams. It is known that the mean charge state of the ion beam lies between 1 and 4, depending on cathode material, arc current, arc pulse duration, presence or absence of magnetic field at the cathode, as well as background gas pressure. A characteristic of the vacuum arc ion beam i...

Optimization of the Adhesion Strength of Arc Ion Plating TiAlN Films by the Taguchi Method

A three-level six-factor (arc power, substrate temperature, pre-treatment bias voltage, working pressure, deposition bias voltage and pretreatment time) orthogonal experimental array (L18) to optimize the adhesion strength of arc ion plating (AIP) TiAlN films was designed using the Taguchi method. An optimized film process, namely substrate temperature 220 °C, arc power 60 A, negative bias volt...